7-1/2" Foam, Soft Density, H&L Backing Polishing Pad
3 items in stock in store | Aisle 22, Section 13
Shop Buffing Pads/BonnetsMAKITA Polishing Pad 7-1/2" Foam, Soft Density for Finessing, H&L Backing
Features:
- Collapsed Cell System (CCS) foam polishing pads
- Partially closed cells are strategically patterned to drastically improve polishing performance by evenly dispersing compound/polishing onto the working surface
- Slower rate of polish absorption enhances polishing performance
- Reduced surface tension allows operator to run pad flat on the working surface with greatly minimized pad skipping
- CCS pockets gradually release compound/polish as required, resulting in increased operator control
- Reduced surface contact generates less friction and heat
- Curved edges enable easier polishing in corners and along edges
- Hook and Loop backing
- Machine wash in warm water and air dry to clean
Includes:
- MAKITA Polishing Pad 7-1/2" Foam, Soft Density for Finessing, H&L Backing
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